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Language:
None
Total Size:
74.3 MB
Info Hash:
39F00CD9B1F184A1E3551B627BC4E3F8CD472BD1
Added By:
Added:
June 10, 2025, 7:36 p.m.
Stats:
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(Last updated: June 11, 2025, 1:23 p.m.)
| File | Size |
|---|---|
| ['Prall K. CMOS Plasma and Process Damage 2025.pdf'] | 0 bytes |
Name
DL
Uploader
Size
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Added
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74.3 MB
[36
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32]
2025-06-10
| Uploaded by andryold1 | Size 74.3 MB | Health [ 36 /32 ] | Added 2025-06-10 |
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950.3 MB
[1
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2026-03-02
| Uploaded by LittleMouse | Size 950.3 MB | Health [ 1 /4 ] | Added 2026-03-02 |
NOTE
SOURCE: Prall K. CMOS Plasma and Process Damage 2025
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COVER
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MEDIAINFO
Textbook in PDF format This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems
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